Date: 28 October 2010 Location: Research Institute for Technical Physics and Materials Science (MTA MFA) Budapest, Konkoly-Thege Miklós u. 29 – 33 Building: 26, Conference Room
Organized jointly by:
Research Institute for Technical Physics and Materials Science (MTA MFA), Budapest, Hungary
Korea Research Institute for Standards &Science (KRCF KRISS), Daejeon, Republic of Korea
PROGRAM
10:00 – 10:10 Prof. László P. BIRÓ (MTA MFA) Opening words Dr. Chanyong HWANG (KRCF KRISS)
10:10 – 10:50 Dr. Wondong KIM (KRCF KRISS): STM study on the expitaxial graphene
10:50 – 11:30 Dr. Yong Sung KIM (KRCF KRISS): Computational materials research for nanoscience
11:30 – 12:10 Dr. Levente TAPASZTÓ (MTA MFA): Graphene nanolithography
12:10 – 12:20 Closing remarks
Please, be so kind and register if you wish to participate at: http://www.nanotechnology.hu/conf/korea2010/korea2010_registration_form.html