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Authors : Horváth,E.;Neumann,P.,L.;Tóth,A.,L.;Vázsonyi,É.;Koós,A.,A.;Horváth,Z.,E.;Fürjes,P.;Dücső,C.;Bíró,L.,P.
Title : Electrical Characterization of Tungsten Nanowires Deposited by Focused Ion Beam (FIB)
JournalName : Nanopages
PubDateYear : 2006
PubDateOther :
Volume : 1
Issue :
StartPage : 255
EndPage : 262
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Abstract : The deposition of nanowires for interconnects in nanoelectronic devices were studied morphologically by scanning electron microscopy (SEM), atomic force microscopy (AFM) and by in-situ resistance measurements. The deposition and basic characterization of nanometer size tungsten wires by gas injection (GIS) and focused ion beams (FIB) was carried out in-situ in a LEO 1540 XB workstation. The I(V) measurement showed that the deposited W wires have ohmic characteristic. The variation of the resistance during an ex-situ heating was linear with a low thermal coefficient (4% of the pure metallic W).
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