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Authors : Nagy,N.;Pap,A.,E.;Horváth,E.;Volk,J.;Bársony,I.;Deák,A.;Hórvölgyi,Z.
Title : Large area self-assembled masking for photonic applications
JournalName : Applied Physics Letters
PubDateYear : 2006
PubDateOther :
Volume : 89
Issue :
StartPage : 063104-1
EndPage : 063104-3
Keywords :
Notes :
Abstract : Ordered porous structures for photonic application were fabricated on p- and n-type silicon by means of masking against ion implantation with Langmuir-Blodgett LB films. LB films from Stöber silica spheres J. Colloid Interface Sci. 26, 62 1968 of 350 nm diameter were applied in the boron and phosphorus ion-implantation step, thereby offering a laterally periodic doping pattern. Ordered porous silicon structures were obtained after performing an anodic etch and were then removed by alkaline etching resulting in the required two-dimensional photonic arrangement. The LB silica masks and the resulting silicon structures were studied by field emission scanning electron microscope analysis.
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