Electrical Characterization of Tungsten
Nanowires Deposited by Focused Ion Beam
(FIB)
JournalName :
Nanopages
PubDateYear :
2006
PubDateOther :
Volume :
1
Issue :
StartPage :
255
EndPage :
262
Keywords :
Notes :
Abstract :
The deposition of nanowires for interconnects in nanoelectronic devices were
studied morphologically by scanning electron microscopy (SEM), atomic force
microscopy (AFM) and by in-situ resistance measurements. The deposition and basic
characterization of nanometer size tungsten wires by gas injection (GIS) and focused ion
beams (FIB) was carried out in-situ in a LEO 1540 XB workstation. The I(V)
measurement showed that the deposited W wires have ohmic characteristic. The
variation of the resistance during an ex-situ heating was linear with a low thermal
coefficient (4% of the pure metallic W).